FUJITSU QUALITY LABORATORY

ICP-AES

Inductively Coupled Plasma Atomic Emission Spectroscopy

Inductively Coupled Plasma Atomic Emission Spectroscopy is used to analyze element contained in substance by inducing substance constituent to emit plasma to be then dispersed.
Through this method, main element, sub element, and trace constituent contained in metal, glass, ceramic, paper, tissue, rinse water or industrial waste water can be qualitatively / qualitatively analyzed with high sensitivity and accuracy.

Equipment

ICP-AES

ICP atomic emission spectroscopy system
Model number: SPS1700HVR
Specifications: Sequential type
Wavelength range: 160-800nm
Sensitivity: ppb-ppm

Example

Solder bath - eluted impurity analysis

Unit: ug/g = ppm
Solder bath Silver Aluminum Arsenic Gold Bismuth Cupper Iron Antimony Zinc
A 107 5 3 > 3 > 23 863 6 237 3 >
B 108 6 3 > 3 > 26 2054 6 158 3 >
C 69 8 3 > 3 > 20 772 4 75 3 >
Max containable 200,000> 50> 300> 10,000> 1,000> 4,000> 300> 5,000> 50>

In automatic soldering machine in production line, soldering quality is greatly influenced by component lead metal eluted into solder bath.
The table shows the eluted impurity analysis result.
In each tested bath, the content falls within tolerance, but amount of Cu eluted in bath B is greater than that of bath A and C. Therefore, periodical quality control analysis as well as review is necessary on dipping conditions (e.g. duration, temperature).